PARYLENE DEPOSITION SYSTEM

Model: SCS Labcoter™ 2 (PDS 2010)

The Labcoter™ 2 is a Parylene Deposition System (PDS 2010) designed for the laboratory environment. The instrument is a vacuum system used for the vapor deposition of Parylene polymer onto a variety of substrates. It is equipped with a remote Edwards rotary vane vacuum pump, a manually filled LN2 cold trap, fixture rotation for coating uniformity, closed-loop pressure control and continuous process monitoring for precise control of coating rate and thickness. Parylene coatings can be applied in thicknesses from several hundred angstroms to 75 microns and provide an extremely effective chemical and moisture barrier with high dielectric and mechanical strength. Components such as circuit boards, sensors, metallic wires, wafers, medical devices, and MEMs in sample sizes up to 10in.x10 in. can be coated in the Labcoter™ 2. The deposition process begins as the powdered precursor (Parylene C dimer) is vaporized under vacuum (10-100 milliTorr) and heated to form a dimeric gas (175 °C). The gas is then pyrolyzed (690 °C) to cleave the dimer into its monomeric form, and finally is deposited as a transparent polymer film. The polymerization process occurs at ambient temperatures. At the vacuum levels employed, all sides of the substrate are uniformly impinged by the gaseous monomer, which results in a truly conformal, pinhole-free coating.

Chemical structures of Parylene N, C, D and HT:

Parylene is the generic name for members of a unique polymer series. The basic member of the series is Parylene N or poly(para-xylylene). Parylene C is produced from the same raw material (dimer) as parylene N, modified only by the substitution of a chlorine atom for one of the aromatic hydrogens.

Sources: SCS-2010 brochure; SCS parylene properties; Operation Manual-610-1002-37